JPH0474854B2 - - Google Patents

Info

Publication number
JPH0474854B2
JPH0474854B2 JP57165280A JP16528082A JPH0474854B2 JP H0474854 B2 JPH0474854 B2 JP H0474854B2 JP 57165280 A JP57165280 A JP 57165280A JP 16528082 A JP16528082 A JP 16528082A JP H0474854 B2 JPH0474854 B2 JP H0474854B2
Authority
JP
Japan
Prior art keywords
pattern
stage
original
original image
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57165280A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5954225A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP57165280A priority Critical patent/JPS5954225A/ja
Publication of JPS5954225A publication Critical patent/JPS5954225A/ja
Publication of JPH0474854B2 publication Critical patent/JPH0474854B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57165280A 1982-09-21 1982-09-21 投影露光方法 Granted JPS5954225A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57165280A JPS5954225A (ja) 1982-09-21 1982-09-21 投影露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57165280A JPS5954225A (ja) 1982-09-21 1982-09-21 投影露光方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP4249109A Division JPH0766905B2 (ja) 1992-09-18 1992-09-18 投影露光方法

Publications (2)

Publication Number Publication Date
JPS5954225A JPS5954225A (ja) 1984-03-29
JPH0474854B2 true JPH0474854B2 (en]) 1992-11-27

Family

ID=15809326

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57165280A Granted JPS5954225A (ja) 1982-09-21 1982-09-21 投影露光方法

Country Status (1)

Country Link
JP (1) JPS5954225A (en])

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0669017B2 (ja) * 1985-10-08 1994-08-31 株式会社ニコン 位置合わせ方法
JPS6144429A (ja) * 1984-08-09 1986-03-04 Nippon Kogaku Kk <Nikon> 位置合わせ方法、及び位置合せ装置
JPH069182B2 (ja) * 1985-02-01 1994-02-02 株式会社日立製作所 投影露光方法
JPH0630334B2 (ja) * 1986-02-07 1994-04-20 キヤノン株式会社 露光方法
JPH07105324B2 (ja) * 1986-03-19 1995-11-13 東芝機械株式会社 レ−ザミラ−の位置変位補正方法
JP2661015B2 (ja) * 1986-06-11 1997-10-08 株式会社ニコン 位置合わせ方法
JPS63250120A (ja) * 1987-04-07 1988-10-18 Mitsubishi Electric Corp アライメント補正装置
JPH0766905B2 (ja) * 1992-09-18 1995-07-19 株式会社日立製作所 投影露光方法
JP2646417B2 (ja) * 1992-10-30 1997-08-27 キヤノン株式会社 露光装置
JP2638528B2 (ja) * 1994-12-19 1997-08-06 株式会社ニコン 位置合わせ方法
JP2967974B2 (ja) * 1996-12-09 1999-10-25 株式会社ニコン 回路パターンの形成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5780724A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Positioning device
JPS5717132A (en) * 1980-07-07 1982-01-28 Fujitsu Ltd Formation of microscopic pattern using lithography and device thereof

Also Published As

Publication number Publication date
JPS5954225A (ja) 1984-03-29

Similar Documents

Publication Publication Date Title
JP3501276B2 (ja) 半導体ウエハの位置合わせ方法
JPS6313329A (ja) 露光方法
US6239858B1 (en) Exposure method, exposure apparatus and semiconductor device manufactured by using the exposure apparatus
JP2646412B2 (ja) 露光装置
JP2610815B2 (ja) 露光方法
JPH0474854B2 (en])
US10497658B2 (en) Method of pattern placement correction
JPH09260274A (ja) 露光装置および露光方法
JPH10223528A (ja) 投影露光装置及び位置合わせ方法
JPH10284396A (ja) アライメント方法及び重ね合わせ精度計測方法
JP3337921B2 (ja) 投影露光装置および位置合せ方法
JP6926596B2 (ja) 露光装置および露光方法
JP2868548B2 (ja) アライメント装置
JP2909053B2 (ja) 投影露光装置
JP2675528B2 (ja) 投影露光方法
JP2909052B2 (ja) 投影露光装置
JP3168590B2 (ja) 縮小投影露光方法
KR102333943B1 (ko) 노광장치, 스테이지 교정 시스템, 및 스테이지 교정방법
JP2626637B2 (ja) 位置合わせ方法
JPH0766905B2 (ja) 投影露光方法
JPH1152545A (ja) レチクルおよびそれによって転写されたパターンならびにレチクルと半導体ウエハとの位置合わせ方法
US20010031406A1 (en) Photomask and exposure method
JPH0782390B2 (ja) ステージ位置決め方法
JP3252412B2 (ja) 位置合わせ方法、及びその位置合わせ方法を含んだ露光方法、及びその露光方法を用いたデバイス製造方法、並びに位置合わせ装置、及びその位置合わせ装置を備えた露光装置、及びその露光装置により製造されたデバイス
JPH03110818A (ja) アライメント装置